Pulsed Chemical Vapour Deposition 


Solar cells continue to face issues of cost and efficiency. One way to solve these problems is the material to make the solar cell or photovoltaic (PV) cheaper with higher or comparable efficiency. Titania or titanium dioxide (TiO2) is of interest. TiO2 has been studied and applied for many applications which includes photocatalysis, self cleaning glass, thermal barrier coating, anti-reflection material, and as anti-sticking material. Moreover, TiO2 has been reported to be used in Graetzel cells which may provide a simple, low cost way to generate energy from solar. 

Not only is the material, in our case TiO2, important but also the characteristic of the films. In this project, uniformity of step coverage of TiO2 on micro- and nano-scale features by pulsed-pressure metalorganic chemical vapor deposition (PP-MOCVD) is investigated. The uniformity of the films is an important aspect to certain applications. These include photovoltaic, electronic devices, and imprint lithography techniques. In general low pressure CVD or MOCVD and atomic layer deposition (ALD) could produce conformal step coverage. Nevertheless, PP-MOCVD is a low cost, provide faster growth rate, and can adjust for thicker films compared to LPCVD and ALD. 

Study of conformal step coverage using PP-MOCVD could provide useful information for industrial scale.  It is also possible to adapt this method to deposit TiO2 and also to deposit other materials for energy applications. One promising application is for biomedical implants, which requires a conformal coverage on features as well.


People: Vilailuck Siriwongrungson 

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